File:Leiterbahn ausfallort elektromigration.jpg

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Leiterbahn_ausfallort_elektromigration.jpg(512 × 512 pixels, file size: 65 KB, MIME type: image/jpeg)

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Description
Deutsch: Aufnahme eines Ausfallortes verursacht durch Elektromigration in einer Kupferleiterbahn unter dem Rasterelektronenmikroskop (REM). Die Passivierung wurde vorher durch w:de:Plasmaätzen (RIE) und w:de:Fluorwasserstoffsäure (HF) entfernt. Die Ätzprozesse sind dabei nicht erprobt gewesen und beruhen auf Versuchen das bestmögliche Resultat zu erlangen.
English: SEM image of a failure caused by electromigration in a copper interconnect. The passivation has been removed by RIE and HF
Source Mit dem Rasterelektronenmikroskop aufgenommen
Author Patrick-Emil Zörner
Other versions keine bekannt!


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w:en:Creative Commons
attribution share alike
This file is licensed under the Creative Commons Attribution-Share Alike 2.0 Germany license.
You are free:
  • to share – to copy, distribute and transmit the work
  • to remix – to adapt the work
Under the following conditions:
  • attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
  • share alike – If you remix, transform, or build upon the material, you must distribute your contributions under the same or compatible license as the original.

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This image was moved to Commons by de:User:Luxo (here: Luxo) with the tool CommonismNow.

  • Source: de.wikipedia.org
  • Image contributor(s): Paddy
    • 2004-03-03T00:01:48Z UTC Paddy 512x512 (66389 bytes)

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current17:24, 6 March 2007Thumbnail for version as of 17:24, 6 March 2007512 × 512 (65 KB)wikimediacommons>CommonismNow{{Information| |Description=Aufnahme eines Ausfallortes verursacht durch Elektromigration in einer Kupferleiterbahn unter dem Rasterelektronenmikroskop (REM). Die Passivierung wurde vorher durch w:de:Reactive Ion Etching (RIE) und [[w:de:Fluorwasserst

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